Perfect Clean

Leaving not a single particle behind, and continuing in perfection…

Technologies are evolving rapidly. Being infrastructural technologies that support industry and society as a whole-not to mention everyone’s daily life-particle measurement for semiconductor wafers and devices, photo masks as well as liquid crystals has been advancing at an incredible pace from the micrometer to the nanometer scale.

Product

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The Spin Sonic Cleaning System

The Spin Sonic Cleaning System has realized high cleaning performance through Chemical-Fine-Jet and ED-Jet technology for horizontally placed wafers.
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Cassette-less Wafer Cleaning System

Smooth robotized transfer without chipping considerably reduces the operational costs.
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Disk Cleaning System

This cleaning equipment has shown significant effects in cleaning memory disks and liquid crystals.
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Evolution Cleaning System

The Evolution Cleaning System is a highly reliable system widely implemented in the cleaning process of diverse precision parts and products.
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Fine-Sonic System

Submicron Particles Can be Removed at High-Frequencies - 800kHZ -3.0MHz - Without Any Damages
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Ultra-Sonic & Sweep Sonic System

Supporting Evolutionary Cleaning with Advanced Ultrasonic Technologies